Program: HathiTrust Digital Library

  • Publisher: American Chemical Society
  • Print ISSN: 1520-6106
  • Electronic ISSN: 1520-5207
  • OCLC Number: 35040264
  • Validation: None
  • Retention: permanent
  • Institution: HathiTrust
  • Facility:
  • OCLC Symbol: HATHI
  • Holdings Format: Print
Materials Archive Action Date of Action Program Status/Note
v.101 no.4-6; v.101 no.7-9; v.101 no.10-12; v.101 no.22-24; v.101 no.25-27; v.101 no.28-30; v.101 no.31-33; v.101 no.34-36; v.101 no.43-45; v.102 no.1-3; v.102 no.4-6; v.102 no.7-9; v.102 no.10-12; v.102 no.13-15; v.102 no.25-27; v.102 no.28-30; v.102 no.31-33; v.102 no.34-36; v.103 no.7-9; v.103 no.31-33; v.103 no.34-36; v.103 no.37-39; v.103 no.40-42; v.105 no.8-10; v.105 no.11-13; v.105 no.14-16; v.105 no.17-19; v.105 no.20-22; v.105 no.23-25; v.105 no.26-28; v.105 no.29-31; v.105 no.32-34; v.106 no.34-36; v.106 no.40-42; v.107 no.4-6; v.107 no.13-15; v.107 no.17-18; v.107 no.19-21; v.107 no.22-24; v.107 no.25-27; v.108 no.46-48; v.108 no.49-50; v.111 no.8-11; v.111 no.12; v.111 no.35,37,38; v.111 no.36; v.111 no.46-47; v.112 no.5; v.112 no.6-9; v.112 no.22-25; v.112 no.41-42; v.112 no.43-45; v.112 no.48-49; v.113 no.1-2; v.113 no.3; v.113 no.4-6; v.113 no.7-8; v.113 no.15-16; v.113 no.17-18; v.113 no.19-20; v.113 no.21-22; v.113 no.23-24; v.113 no.26-30; v.113 no.35-38; v.113 no.39-41; v.113 no.42-43
committed to retain 2011-05-04 HTDL