Program: HathiTrust Digital Library
- Publisher: American Chemical Society
- Print ISSN: 0065-2393
- Electronic ISSN:
- OCLC Number: 1269845
- Validation: None
- Retention: permanent
- Institution: HathiTrust
- Facility:
- OCLC Symbol: HATHI
- Holdings Format: Print
Materials | Archive Action | Date of Action | Program | Status/Note |
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v.22 (1959); no.5; no.7; no.8; no.32; no.33; no.38; no.40; no.46; no.48; no.50; no.53; no.55; no.57; no.59; no.62; no.63; no.66; no.68; no.69; no.70; no.73; no.74; no.78; no.79; no.80; no.81; no.82; no.83; no.84; no.86; no.87; no.88; no.89; no.91; no.92; no.95; no.96; no.98; no.99; no.103; no.104; no.105; no.108; no.109; no.110; no.112; no.114; no.117; no.118; no.119; no.123; no.124; no.125; no.126; no.127; no.128; no.129; no.130; no.131; no.133; no.134; no.135; no.136; no.139; no.140; no.141; no.142; no.143; no.144; no.145; no.146; no.149; no.150; no.152; no.153; no.154; no.155; no.156; no.158; no.159; no.160; no.161; no.162; no.164; no.166; no.167; no.169; no.172; no.173; no.174; no.175; no.176; no.179; no.180; no.181; no.182; no.183; no.184; no.186; no.187; no.188; no.190; no.192; no.193; no.194; no.196; no.197; no.198; no.199; no.202; no.206; no.208; no.209; no.211; no.212; no.213; no.217; no.218; no.219; no.221; no.222; no.223; no.224; no.225; no.226; no.229; no.236; no.240; no.241
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committed to retain | 2021-03-06 | HTDL |
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