Advances in resist technology and processing.
- Publisher: SPIE--The International Society for Optical Engineering
- Print ISSN: 1019-2190
- Electronic ISSN: 1019-2190
- OCLC Number: 21144481
- Subject: Photoresists Congresses.
- Subject code: T
- Publication history: 2 (Mar. 11-12, 1985)-
Print Holdings
Archiving Institution |
Program |
Holdings Description |
Retention |
HathiTrust (HATHI) |
HTDL |
v.2 1985; v.3 1986; v.4 1987; v.5 1988; v.6 1989; v.7 1990; v.8 1991; v.9 1992; v.10 1993; v.13 1996; v.15 pt.1 1998; v.15 pt.2 1998; v.16 pt.1 1999; v.16 pt.2 1999; v.17 pt.1 2000; v.17 pt.2 2000; v.18 pt.1 2001; v.18 pt.2 2001; v.19 pt.1 2002; v.19 pt.2 2002; v.20 pt.1 2003; v.20 pt.2 2003; v.21 pt.1 2004; v.21 pt.2 2004; v.22 pt.1 2005; v.22 pt.2 2005; v.23 pt.1 2006; v.23 pt.2 2006
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permanent
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