Electron-beam, X-ray, EUV, and ion-beam submicrometer lithographies for manufacturing.
- Publisher: SPIE
- Print ISSN:
- Electronic ISSN:
- OCLC Number: 35814213
- Subject: Lithography, Electron beam Congresses.
- Subject code: QC
- Publication history: 5 (20-21 Feb. 1995)-
Print Holdings
| Archiving Institution | Program | Holdings Description | Retention |
|---|---|---|---|
| HathiTrust (HATHI) | HTDL | 1995-1996 | permanent |