Photomask and X-ray mask technology.
- Publisher: SPIE
- Print ISSN:
- Electronic ISSN:
- OCLC Number: 31981427
- Subject: Optical instruments Design and construction Congresses.
- Subject code: QC
- Publication history: [1st] (22 Apr. 1994)-
Print Holdings
| Archiving Institution | Program | Holdings Description | Retention |
|---|---|---|---|
| HathiTrust (HATHI) | HTDL | v.1 1994; v.2 1995; v.3 1996; v.4 1997; v.5 1998; v.6 1999 | permanent |